This preinstall guide specifies the work environment required to
accommodate FEI’s Helios PFIB DualBeam system and its
accessories prior to installation at the customer site. The time and
expense devoted to a proper survey for placing the Helios PFIB
DualBeam will be rewarded by the consequent trouble-free,
consistent operation, and the resulting reduction in downtime.
The customer is responsible for preparing the auxiliary equipment
room and workroom, which includes meeting the specified
ambient conditions and required services. Whether the room will
be converted from an existing space or built new, the environment
must meet the specifications in this document to enable optimum
instrument performance.
Prior to installation, an FEI field service engineer will inspect the
site and complete the Site Survey Checklist to verify that the work
area meets these requirements (page 3).
Product Description
The Helios PFIB DualBeam is the world’s most advanced
DualBeam platform for Large Area Sample Preparation and
analysis in semiconductor failure analysis, process development
and process control laboratories. The Helios PFIB DualBeam
system combines the innovative Elstar™ with UC technology
electron column, for high-resolution, high-contrast imaging, with
the high-performance Vion™ Xe plasma ion column, for fast and
precise large area sample cross-sectioning and deprocessing.
In addition to the industry leading SEM and FIB columns, the
Helios PFIB DualBeam incorporates a suite of innovative
technologies which enable simple and consistent sample
preparation on even the most challenging samples.
貨物類號：FEI VION PFIB Helios PFIB
貨物庫存：本商品現貨庫存2PCS
貨物貨期：到中國55-80工作日，全球DHL送達35-45工作日。
貨物儲存：NL